Effect of Back-Etching on Residual stress in Lead Titanate Thin Film on Si wafer deposited by Chemical Solution Deposition

著者名

T. Ohno, H.Suzuki, H.Masui, K.Ishikawa and M.Fujimoto

論文題目

Effect of Back-Etching on Residual stress in Lead Titanate Thin Film on Si wafer deposited by Chemical Solution Deposition

雑誌名

Jpn. J. Appl. Phys.

雑誌 巻・号・項

43 pp.6549-6553

発行年

2004