Origin of Compressive Residual Stress in Alkoxide derived PTO thin film on Si wafer

著者名

T. Ohno, B. Malic, H. Fukazawa, N. Wakiya, H. Suzuki, T. Matsuda and M. Kosec

論文題目

Origin of Compressive Residual Stress in Alkoxide derived PTO thin film on Si wafer

雑誌名

Jpn. J. Appl. Phys.

雑誌 巻・号・項

47, pp.7514-7518

発行年

2008