Stress engineering of the alkoxide derived ferroelectric thin film on Si wafer

著者名

T. Ohno, B. Malic, H. Fukazawa, N. Wakiya, H. Suzuki, T. Matsuda and M. Kosec

論文題目

Stress engineering of the alkoxide derived ferroelectric thin film on Si wafer

雑誌名

J. Ceram Soc. Jpn.

雑誌 巻・号・項

117, pp.108-1094

発行年

2009