研究論文

TEM Microstructure Analysis for Compressively Stressed PZT Thin Film by CSD Derived LaNiO₃ Bottom Electrodes

Functional Mater. Lett. 2012
5(2) 1260016
K. Ozawa, M. Ishizuka, N. Sakamoto T. Ohno, T. Kiguchi, T. Matsuda T. Konno, N. Wakiya and H. Suzuki

プロシーディング

Stress Engineering of Lead Free Ferroelectric Thin Films

47th International Conference on Microelectronics , Devices and Materials with the Workshop on Organic Semiconductors, Technologies and Devices 2011
2011, Sep. 28-30
T. Ohno, K. Fukamachi, N. Skakamoto, D. S. Fu, N. Wakiya, T. Matsuda and H. Suzuki

研究論文

Effect of Stress Engineering on the Electrical Properties of BaTiO₃ Thin Film

Jpn. J. Appl. Phys. 2011
50 09NA03
K. Fukamachi, N. Sakamoto, T. Ohno, D. S. Fi, N. Wakiya, T. Matsuda and H. Suzuki

研究論文

Control of the coating layer thickness of TiO₂-SiO₂ core-shell hybrid particles by liquid phase deposition

Adv. Powder Technol. 2011
22 390-395
T. Ohno, K. Numakura, H. Itoh, H. Suzuki, and T. Matsuda

研究論文

The agglomeration control of alkoxide derived TiO₂-SiO₂ hybrid nano-particle

Trans. Mater. Res. Soc. Jpn. 2011
36[2] 237-240
S. Tagawa, T. Ohno, H. Itoh, H. Suzuki and T. Matsuda

研究論文

Heptane isomerization over molybdenum oxides obtained by H₂ reduction of H_xMoO₃ with different hydrogen contents

Appl. Catal. 2010
A 389 52-59
T. Ohno, Z. Li, N. Sakai, H. Sakagami, N. Takahashi, T. Matsuda

研究論文

Preparation and Characterization of Alkoxide Derived Lead-Free Piezoelectric Barium Zirconate Titanate Thin Films with Different Compositions

Jpn. J. Appl. Phys. 2010
49 09MA11
T. Ohno, K. Uchida, N. Sakamoto, D. S. Fu, N. Wakiya, T. Matsuda, and H. Suzuki

研究論文

Effect of the electrode structure on the electrical properties of alkoxide derived ferroelectric thin film

Mater Lett. 2010
64 1742-1744
T. Ohno, T. Matsuda, T. Nukina, N. Sakamoto, N. Wakiya, S. Tokuda and H. Suzuki

研究論文

化学溶液法で作製されたカルシウムアルミネート微粒子の粉砕効果

粉体工学会誌 2010
47, pp.304-309
坂元尚紀、渡邉翔太、堀雅仁、大野智也、符徳勝、脇谷尚樹、松田剛、鈴木久男

研究論文

Stress engineering of the alkoxide derived ferroelectric thin film on Si wafer

J. Ceram Soc. Jpn. 2009
117, pp.108-1094
T. Ohno, B. Malic, H. Fukazawa, N. Wakiya, H. Suzuki, T. Matsuda and M. Kosec